Chemistry compatible coating material for advanced device on-wafer particle performance

ABSTRACT

A chamber component comprises a body and a plasma sprayed ceramic coating on the body. The plasma sprayed ceramic coating is applied using a method that includes feeding powder comprising a yttrium oxide containing solid solution into a plasma spraying system, wherein the powder comprises a majority of donut-shaped particles, each of the donut-shaped particles having a spherical body with indentations on opposite sides of the spherical body. The method further includes plasma spray coating the body to apply a ceramic coating onto the body, wherein the ceramic coating comprises the yttrium oxide containing solid solution, wherein the donut-shaped particles cause the ceramic coating to have an improved morphology and a decreased porosity as compared to powder particles of other shapes, wherein the improved surface morphology comprises a reduced amount of surface nodules.

PRIORITY CLAIM

This application is a divisional application of U.S. patent applicationSer. No. 15/084,299, filed Mar. 29, 2016, which is a continuationapplication of U.S. patent application Ser. No. 13/830,608, filed Mar.14, 2013, now issued as U.S. Pat. No. 9,343,289, which claims thebenefit of U.S. Provisional Application Ser. No. 61/676,818 filed onJul. 27, 2012, all of which are hereby incorporated by reference.

TECHNICAL FIELD

Embodiments of the present disclosure relate, in general, to ceramiccoated articles and to a process for applying a ceramic coating todielectric etch processing components.

BACKGROUND

In the semiconductor industry, devices are fabricated by a number ofmanufacturing processes producing structures of an ever-decreasing size.Some manufacturing processes such as plasma etch and plasma cleanprocesses expose a substrate to a high-speed stream of plasma to etch orclean the substrate. The plasma may be highly corrosive, and may corrodeprocessing chambers and other surfaces that are exposed to the plasma.This corrosion may generate particles, which frequently contaminate thesubstrate that is being processed, contributing to device defects.

As device geometries shrink, susceptibility to defects increases andparticle contaminant requirements become more stringent. Accordingly, asdevice geometries shrink, allowable levels of particle contamination maybe reduced. To minimize particle contamination introduced by plasma etchand/or plasma clean processes, chamber materials have been developedthat are resistant to plasmas. Different materials provide differentmaterial properties, such as plasma resistance, rigidity, flexuralstrength, thermal shock resistance, and so on. Also, different materialshave different material costs. Accordingly, some materials have superiorplasma resistance, other materials have lower costs, and still othermaterials have superior flexural strength and/or thermal shockresistance.

BRIEF DESCRIPTION OF THE DRAWINGS

The present invention is illustrated by way of example, and not by wayof limitation, in the figures of the accompanying drawings in which likereferences indicate similar elements. It should be noted that differentreferences to “an” or “one” embodiment in this disclosure are notnecessarily to the same embodiment, and such references mean at leastone.

FIG. 1 illustrates a cross-sectional view of a liner kit.

FIG. 2 illustrates an exemplary architecture of a manufacturing system.

FIG. 3 illustrates a cross-sectional view of a plasma spray system.

FIG. 4 illustrates a method of applying a coating to an articleaccording to one embodiment.

FIG. 5 illustrates powder shapes for a coating.

FIG. 6A illustrates a powder size distribution for a coating.

FIG. 6B illustrates a powder size distribution for a coating accordingto one embodiment.

FIG. 7A illustrates nodule count of a coating according to oneembodiment.

FIG. 7B illustrates surface roughness of a coating according to oneembodiment.

FIG. 7C illustrates a cross-sectional porosity of a coating according toone embodiment.

FIG. 8 illustrates application of a coating.

FIG. 9 illustrates a method of applying a coating according to oneembodiment.

FIG. 10 illustrates scanning electron microscope (SEM) views of coatingsurface.

FIG. 11 illustrates SEM views of cross-sections of coatings.

FIG. 12A illustrates particle performance of a coating over time.

FIG. 12B illustrates particle performance of a coating according to oneembodiment.

DETAILED DESCRIPTION

Embodiments of the invention are directed to an article, e.g., a plasmascreen, a liner kit, showerhead, lid, electrostatic chuck, or otherchamber components exposed to reducing plasma chemistry for asemiconductor processing chamber, including Al or Al₂O₃ or SiCsubstrate, and a ceramic coating on the article. In one embodiment, theceramic coating is a composite ceramic, including a compound of Y₄Al₂O₉(YAM) and a solid solution of Y_(2-x)Zr_(x)O₃, wherein the ceramiccoating is resistant to reducing chemistry (H₂, CO, COS, CH₄ etc).

A method of coating the ceramic coating on the article includesproviding a plasma spraying system having a plasma current in the rangeof between about 90 A to about 150 A, and positioning a torch standoffof the plasma spraying system a distance from an article between about60 mm and about 120 mm. The method also includes flowing gas through theplasma spraying system at a rate of between about 80 L/min and about 130L/min, and plasma spray coating the article with a ceramic coating.

The conductor etch process involves plasma assisted etching of aconductive substrate such as Si wafer by a gas mixture. In conductoretch, on-wafer level particle performance is primarily correlated tochamber critical components, especially the liner kit 100 with a frontside 120, a back side 122, and an outer diameter 124, which can includea chamber body 111, an upper liner 101, slit valve door 103, plasmascreen 105 (i.e., the grill-like structure around the wafer), lowerliner 107 and cathode liner 109, as shown in FIG. 1. The upper liner101, slit valve door 103 and lower liner 107 are closer to the chamberbody 111, whereas the plasma screen 105 is located around a wafer (notshown, but is located at position 130 during operation) and the cathodeliner 109 sits below the wafer.

A standard liner kit may be made up of an Al substrate coated with 8-12mil of plasma sprayed Y₂O₃ (yttria) or other ceramic with a surfaceroughness of about 100-270 μin. For most typical semiconductorapplications, an on-wafer particle specification is a maximum of about30 adders (e.g., stray particles located on the wafer) at greater thanor equal to 90 nm particle size. A standard Y₂O₃ liner kit meets thison-wafer particle specification.

For specific advanced applications at a 28 nm device nodes, the on-waferparticle specification is much more stringent at less than or equal to1.3 adders at greater than or equal to 45 nm size. Moreover, theseapplications may use reducing chemistry (H₂, CH₄, CO, COS, etc), whichoften increases on-wafer particle contamination. Chamber tests usingconventional Y₂O₃ coated liner kits under reducing chemistry show highon-wafer particles (e.g., about 50 to 100 or more adders at greater thanor equal to 45 nm particle size), though significant chamber seasoning(e.g., 100 to 150 radio frequency RF hours of processing) can reduce theparticle defect level down to about 0 to 10 adders at greater than orequal to 45 nm particle size to meet the production specificationsbefore production can resume. However, long chamber seasoning times canreduce productivity. In tests, energy dispersive X-ray spectroscopy hasconfirmed that conventional Y₂O₃-based on-wafer particles may originatefrom the liner kit.

Further, Y₂O₃ coatings are less stable under reducing chemistry (e.g.,H2, CH4, CO, COS, etc.) and form significant Y—OH. Y—OH conversionresults in volume change which results in shed particles that may foundon the wafer. However, in the absence of reducing chemistry, Y₂O₃ isstable and does not shed particles.

Embodiments of the present invention include a composite ceramic coatingmaterial to increase compatibility with use of reducing chemistries, inorder to improve on-wafer particle performance for chamber components insemiconductor industry applications. For example, in the liner kitapplication, the composite ceramic coating (e.g., a Yttria basedcomposite ceramic coating) may be applied to the plasma facing side ofthe liner kit using a plasma spray technique. In other embodiments, acomposite ceramic coating can be applied via aerosol deposition, slurryplasma, or other suitable techniques such as other thermal sprayingtechniques. In one example, the coating thickness on an Aluminum linerkit can be up to 25 mil. In another example, Al₂O₃ or other metal oxidesubstrates, where the coefficient of thermal expansion (CTE) of thecoating is better matched to the CTE of the substrate, can have athicker coating.

In one embodiment, the composite ceramic coating is composed of acompound Y₄Al₂O₉ (YAM) and a solid solution Y_(2-x)Zr_(x)O₃ (Y₂O₃—ZrO₂solid solution). In a further embodiment, the composite ceramic coatingincludes 62.93 mol % Y₂O₃, 23.23 mol % ZrO₂ and 13.94 mol % Al₂O₃. Inanother embodiment, the composite ceramic coating can include Y₂O₃ in arange of 50-75 mol %, ZrO₂ in a range of 10-30 mol % and Al₂O₃ in arange of 10-30 mol %. In other embodiments, other distributions may alsobe used for the composite ceramic coating. In one embodiment, thecomposite ceramic is a yttrium oxide containing solid solution that maybe mixed with one or more of ZrO₂, Al₂O₃, HfO₂, Er₂O₃, Nd₂O₃, Nb₂O₅,CeO₂, Sm₂O₃, Yb₂O₃, or combination thereof.

During testing of various coatings, the on-wafer particle level wasobserved without CO and H₂ (non-reducing chemistry), and with CO and H₂(i.e., under reducing chemistry). The composite ceramic coatingexhibited better erosion resistance, particularly with reducingchemistry, than other coatings and bulk materials tested (e.g., bulkY₂O₃, plasma sprayed (PS) Y₂O₃, SiC, columnar Si, single crystal Si, andSiO₂), showing a lower erosion rate (erosion depth per RFhr) than theother coatings tested. For example, FIG. 12A shows on-wafer particleperformance of a Y₂O₃ coating for >45 nm particles over RF hours. Here,the coating showed a high number of YO particles in the initial phase(e.g., less than 20 RF hours), and 80 to 100 RF hours were required toreach a stable number of particles. FIG. 12B shows on-wafer particleperformance of a composite ceramic coating for 45 nm particle over RFhours, where the coating did not show high numbers of YO particlesduring seasoning, and the number of YO particles was consistently low(i.e., less than 5 adders) at 60 RF hours.

FIG. 2 illustrates an exemplary architecture of a manufacturing system200. The manufacturing system 200 may be a coating manufacturing system(e.g., for applying a composite ceramic coating to an article, such as aliner kit). In one embodiment, the manufacturing system 200 includesprocessing equipment 201 connected to an equipment automation layer 215.The processing equipment 201 may include a bead blaster 202, one or morewet cleaners 203, a plasma spray gun system 204 and/or other equipment.The manufacturing system 200 may further include one or more computingdevices 220 connected to the equipment automation layer 215. Inalternative embodiments, the manufacturing system 200 may include moreor fewer components. For example, the manufacturing system 200 mayinclude manually operated (e.g., off-line) processing equipment 201without the equipment automation layer 215 or the computing device 220.

Bead blaster 202 is a machine configured to roughen the surface ofarticles (e.g., a liner kit). Bead blaster 202 may be a bead blastingcabinet, a hand held bead blaster, or other type of bead blaster. Beadblaster 202 may roughen a substrate by bombarding the substrate withbeads or particles. In one embodiment, bead blaster 202 fires ceramicbeads or particles at the substrate. The roughness achieved by the beadblaster 202 may be based on a force used to fire the beads, beadmaterials, bead sizes, distance of the bead blaster from the substrate,processing duration, and so forth. In one embodiment, the bead blasteruses a range of bead sizes to roughen the ceramic article.

In alternative embodiments, other types of surface rougheners than abead blaster 202 may be used. For example, a motorized abrasive pad maybe used to roughen the surface of ceramic substrates. A sander mayrotate or vibrate the abrasive pad while the abrasive pad is pressedagainst a surface of the article. A roughness achieved by the abrasivepad may depend on an applied pressure, on a vibration or rotation rateand/or on a roughness of the abrasive pad.

Wet cleaners 203 are cleaning apparatuses that clean articles (e.g., aliner kit) using a wet clean process. Wet cleaners 203 include wet bathsfilled with liquids, in which the substrate is immersed to clean thesubstrate. Wet cleaners 203 may agitate the wet bath using ultrasonicwaves during cleaning to improve a cleaning efficacy. This is referredto herein as sonicating the wet bath. In other embodiments, alternativetypes of cleaners such as dry cleaners may be used to clean thearticles. Dry cleaners may clean articles by applying heat, by applyinggas, by applying plasma, and so forth.

Ceramic coater 204 is a machine configured to apply a ceramic coating tothe surface of a substrate. In one embodiment, ceramic coater 204 is aplasma sprayer (or plasma spray system) that plasma sprays a coating(e.g., a composite ceramic coating) onto the substrate (e.g., a linerkit). In alternative embodiments, the ceramic coater 204 may apply otherthermal spraying techniques such as detonation spraying, wire arcspraying, high velocity oxygen fuel (HVOF) spraying, flame spraying,warm spraying and cold spraying may be used. Additionally, ceramiccoater 204 may perform other coating processes such as aerosoldeposition, electroplating, physical vapor deposition (PVD) and chemicalvapor deposition (CVD) may be used to form the ceramic coating.

The equipment automation layer 215 may interconnect some or all of themanufacturing machines 201 with computing devices 220, with othermanufacturing machines, with metrology tools and/or other devices. Theequipment automation layer 215 may include a network (e.g., a locationarea network (LAN)), routers, gateways, servers, data stores, and so on.Manufacturing machines 201 may connect to the equipment automation layer215 via a SEMI Equipment Communications Standard/Generic Equipment Model(SECS/GEM) interface, via an Ethernet interface, and/or via otherinterfaces. In one embodiment, the equipment automation layer 215enables process data (e.g., data collected by manufacturing machines 201during a process run) to be stored in a data store (not shown). In analternative embodiment, the computing device 220 connects directly toone or more of the manufacturing machines 201.

In one embodiment, some or all manufacturing machines 201 include aprogrammable controller that can load, store and execute processrecipes. The programmable controller may control temperature settings,gas and/or vacuum settings, time settings, etc. of manufacturingmachines 201. The programmable controller may include a main memory(e.g., read-only memory (ROM), flash memory, dynamic random accessmemory (DRAM), static random access memory (SRAM), etc.), and/or asecondary memory (e.g., a data storage device such as a disk drive). Themain memory and/or secondary memory may store instructions forperforming heat treatment processes described herein.

The programmable controller may also include a processing device coupledto the main memory and/or secondary memory (e.g., via a bus) to executethe instructions. The processing device may be a general-purposeprocessing device such as a microprocessor, central processing unit, orthe like. The processing device may also be a special-purpose processingdevice such as an application specific integrated circuit (ASIC), afield programmable gate array (FPGA), a digital signal processor (DSP),network processor, or the like. In one embodiment, programmablecontroller is a programmable logic controller (PLC).

In one embodiment, the manufacturing machines 201 are programmed toexecute recipes that will cause the manufacturing machines to roughen asubstrate, clean a substrate and/or article, coat a article and/ormachine (e.g., grind or polish) a article. In one embodiment, themanufacturing machines 201 are programmed to execute recipes thatperform operations of a multi-operation process for manufacturing aceramic coated article, as described with reference to figures below.The computing device 220 may store one or more ceramic coating recipes225 that can be downloaded to the manufacturing machines 201 to causethe manufacturing machines 201 to manufacture ceramic coated articles inaccordance with embodiments of the present disclosure.

FIG. 3 illustrates a cross-sectional view of a system 300 for plasmaspraying a coating on a dielectric etch component, or other article(e.g., a liner kit) used in a corrosive system. The system 300 is a typeof thermal spray system. In a plasma spray system 300, an arc 302 isformed between two electrodes, an anode 304 and a cathode 316, throughwhich a gas 318 is flowing. Examples of gas suitable for use in theplasma spray system 300 include, but are not limited to, Argon/Hydrogen,Argon/Helium, or Argon/oxygen. As the gas is heated by the arc 302, thegas expands and is accelerated through the shaped nozzle 306, creating ahigh velocity plasma stream.

Powder 308 is injected into the plasma spray or torch where the intensetemperature melts the powder and propels the material as a stream ofmolten particles 314 towards the article 310. Upon impacting the article310, the molten powder flattens, rapidly solidifies, and forms a coating312, which adheres to the article 310. The parameters that affect thethickness, density, and roughness of the coating 312 include type ofpowder, powder size distribution, powder feed rate, plasma gascomposition, gas flow rate, energy input, torch offset distance, andsubstrate cooling.

FIG. 4 is a flow chart showing a process 400 for manufacturing a coatedarticle, in accordance with an embodiment. The operations of process 400may be performed by various manufacturing machines. The operations ofprocess 400 will be described with reference to any article as describedabove, which may be used in a reactive ion etch or plasma etch system.

At block 402, the powder for plasma spraying a coating is optimized.This may include optimization of a powder shape and size distributionfor a composite ceramic coating. In one embodiment, optimizing a coatingincludes, but is not limited, to determining powder type (e.g., chemicalcomposition), average powder size, and a powder feed rate. The powdertype may be selected to produce a composite ceramic coating as describedpreviously. Raw ceramic powders having specified compositions, purityand particle sizes are selected. The ceramic powder may be formed ofY₂O₃, Y₄Al₂O₉, Y₃Al₅O₁₂ (YAG), or other yttria containing ceramics.Additionally, ceramic powder may be combined with one or more of ZrO₂,Al₂O₃, HfO2, Er₂O₃, Nd₂O₃, Nb₂O₅, CeO₂, Sm₂O₃, Yb₂O₃, or other oxides.The raw ceramic powders are then mixed. In one embodiment, raw ceramicpowders of Y₂O₃, Al₂O₃ and ZrO₂ are mixed together for the compositeceramic coating. These raw ceramic powders may have a purity of 99.9% orgreater in one embodiment. The raw ceramic powders may be mixed using,for example, ball milling After the ceramic powders are mixed, they maybe calcinated at a specified calcination time and temperature.

FIG. 5 shows an optimized powder particle shape for the coatingaccording to one embodiment. Here, some of the particles have aspherical shape with deep indentions on opposite side of the sphere. Inother words, most of the particles have a donut shape. Evaluations ofcoatings formed from powder with particles having a donut shape showedimproved morphology and porosity as compared to powder particles ofother shapes. For example, coatings formed of particles having a donutshape tend to have fewer nodules and more splat due to improved meltingof the powders, decreased roughness, and decreased porosity, all ofwhich contribute to improved on-wafer particle performance.

FIG. 6A shows a powder particle size distribution histogram for powderthat was evaluated based on coating surface morphology and porosity whenthe powder was applied as a coating. In FIG. 6A, the particle size(i.e., particle diameter) for 50% of the particles (D50) was about 25microns or less. FIG. 6B shows an optimized powder particle sizedistribution histogram for powder that was also evaluated based oncoating surface morphology and porosity when the powder was applied as acoating, in accordance with an embodiment. In FIG. 6B, the particle sizefor 50% of the particles (D50) was less than or equal to about 15microns. Evaluations of coatings formed from powder with particle sizefor 50% of the particles being about 25 microns or less, as shown inFIG. 6A, showed improved morphology and porosity as compared to powdershaving larger particle sizes, both of which result in improved on-waferparticle performance.

Returning to FIG. 4, at block 404, the plasma spray parameters areoptimized to maximize melting of the powders, reduce the number ofsurface nodules, increase splat surface, reduce roughness, and decreaseporosity. In one embodiment, optimizing plasma spray parametersincludes, but is not limited to, determining plasma gun power, andcomposition of spray carrier gas. Optimizing the plasma spray parametersmay also include optimization of a spray coating sequence and processconditions for applying a coating (e.g., a composite ceramic coating)over a substrate (e.g., a plasma screen).

For example, Table A shows a coating process optimization (e.g., anorthogonal array evaluation) to assess and identify the effect ofmodifying coating parameters on coating surface morphology (e.g.,nodules versus splats).

TABLE A Parameter Level 1 Level 2 Level 3 Powder (microns at D50) 25 15— Primary gas flow rate (L/min) 80 90 130 Secondary gas flow rate (%) 4054 57 Plasma current (A) 90 110 150 Torch standoff distance (mm) 60 80120 Powder injector (g/ml) 10 80 100

Here, examples of results of the evaluation are shown in FIGS. 7A, 7B,and 7C. FIG. 7A shows the number of nodules on a 200× zoom photo (e.g.,a 200× scanning electron micrograph (SEM) of a one inch sample) for eachof the levels for each of the parameters. In one example, the primarygas flow rate for level 1 (80 L/mi) results in a greater number ofnodules (about 60) than the number of nodules (about 45) for the primarygas flow rate for level 2 (90 L/min). Further, the primary gas flow ratefor level 2 results in a greater number of nodules than the number ofnodules (about 43) for the primary gas flow rate for level 3 (130L/min).

In another example, torch standoff distance for level 1 (60 mm) resultsin a greater number of nodules (about 39) than the number of nodules(about 58) for the torch standoff distance for level 2 (80 mm). Further,torch standoff distance for level 2 results in a greater number ofnodules than the number of nodules (about 61) for the torch standoffdistance for level 3 (120 mm).

FIG. 7B shows the average surface roughness (Ra) of a composite ceramiccoating in micro-inches for each of the levels for each of theparameters. In one example, the plasma current level 1 (90 A) results ina greater roughness (about 260) than the roughness (about 255) for theplasma current level 2. Further, the plasma current for level 2 (110 A)results in a greater roughness than the roughness (about 250) for theplasma current level 3 (150 A).

FIG. 7C shows the cross-sectional porosity of the composite ceramiccoating as a percentage for each of the levels for each of theparameters. In one example, the primary gas flow rate for level 1 (80L/min) results in a greater porosity (about 4.2) than the porosity(about 3.4) for the primary gas flow rate for level 2 (90 L/min).Further, the primary gas flow rate for level 2 results in a greaterporosity than the porosity (about 2.6)) for the primary gas flow ratefor level 3 (130 L/min).

In one embodiment, the parameters are optimized to maximize melting,reduce the number of nodules (which can indicate an increase in meltingof powder), increase splat surface (which can indicate an increase inmelting of powder), reduce the surface roughness, and decrease theporosity of the coating, which will decrease the on-wafer particle countunder reducing chemistry because particles are less likely to becomedislodged. The analysis of Table A shows that the parameter levels thatcan optimize the coating are increasing the primary gas flow rate (e.g.,about 130 L/min), increasing the plasma current (e.g., about 150 A),decreasing the torch standoff distance (e.g., about 60 mm), andincreasing the diameter of the particles of the powder (e.g., about lessthan or equal to 25 micron particle diameter for 50% of the particles).

For example, an optimized plasma current can be in the range of betweenabout 90 A to about 150 A. A further optimized plasma current can be inthe range of between about 110 A to about 150 A. In another example, anoptimized positioning of a torch standoff of the plasma spraying systemcan be a distance from the article (e.g., liner kit or plasma screen)between about 60 mm and about 120 mm A further optimized positioning ofa torch standoff can be a distance from the article between about 60 mmand about 90 mm. In yet another example, optimized gas flow through theplasma spraying system can be at a rate of between about 80 L/min andabout 130 L/min. A further optimized gas flow through the plasmaspraying system can be at a rate of between about 90 L/min and about 130L/min.

In the example above, a coating on an article coated according to thefurther optimized parameter can have a nodule count of about 30 nodulesto about 45 nodules per inch, a roughness of about 220 micro inch toabout 250 micro inch, and a cross-sectional porosity of about 2.5% toabout 3.2%.

Returning again to FIG. 4, at block 406, the article is coated accordingto the selected parameters. Thermal spraying techniques and plasmaspraying techniques may melt materials (e.g., ceramic powders) and spraythe melted materials onto the article using the selected parameters. Thethermally sprayed or plasma sprayed ceramic coating may have a thicknessabout 5-40 mil (e.g., 25 mil in one embodiment). The thickness, in oneexample, is selected according to an erosion rate of the compositeceramic coating to ensure that the article has a useful life of at leastapproximately 5000 Radio Frequency Hours (RFHrs). In other words, if theerosion rate of a composite ceramic coating is about 0.005 mil/hr, thenfor a useful life of about 5000 RF hours, a ceramic coating having athickness of about 25 mil may be formed.

The plasma spray process may be performed in multiple spray passes. Foreach pass, the angle of a plasma spray nozzle may change to maintain arelative angle to a surface that is being sprayed. For example, theplasma spray nozzle may be rotated to maintain an angle of approximately45 degrees to approximately 90 degrees with the surface of the articlebeing sprayed.

In one embodiment, the plasma spray sequence can be optimized to achievean improved coating (e.g., less porosity, reduced surface nodules, andreduced surface roughness), as well as reduce re-deposition of strayparticles on to the coating surface (mostly coming from backside coatingof the article). FIG. 8 illustrates one example of an optimized spraysequence for a complex part, such as the plasma screen. First, as shownin block 801, a front side 820 of the article 806 (e.g., a plasmascreen, where a partial cross-sectional view is shown in FIG. 8) issprayed (or coated) at a 45 degree angle by moving a spraying system 805(e.g., a plasma spray system) horizontally 807 across the article 806while the article 806 is rotating, such that the spray ismulti-directional 809. Here, the front side 820 of the article 806 isthe side of the article 806 that will be facing the plasma spray systemwhen the article 806 is installed in a chamber for semiconductormanufacturing. Second, as shown in block 802, the outer diameter 822 ofthe article 806 is sprayed (or coated) by moving the spraying system 805vertically 808 beside the article 806 while the article 805 is rotating,such that the spraying is uni-directional 810. Third, as shown in block803, after the article 806 is flipped, a back side 824 of the article806 is sprayed (or coated) at a 45 degree angle by moving the sprayingsystem 805 horizontally 807 across the article 806 while the article 806is rotating, such that the spray is multi-directional 809. Fourth, atblock 804, the outer diameter 822 of the article 806 is sprayed (orcoated) by moving the spraying system 805 vertically 808 beside thearticle 806 while the article 806 is rotating, such that the spraying isuni-directional 810.

In an example, the coating can be up to about 8 mil thick. However,because the coating is applied thickly in a single coating operation foreach side, coating that is not properly adhered can build up along theedges of the article, such that coating particles can dislodge duringmanufacturing and degrade on-wafer particle performance. Further,because the back side is coated after the front side (which faces theplasma during etch) circulating particulate from the coating of the backside can loosely adhere to the coating on the front side of the article,such that coating particles can dislodge during manufacturing and alsodegrade on-wafer particle performance.

FIG. 9 illustrates a method 900 of spraying an article (e.g., the plasmascreen) according to one embodiment. In a spray sequence according toone embodiment, e.g., a continued improvement process (CIP) #1, inoperation 902, as shown in block 803 of FIG. 8, the back side 824 of anarticle 806 is sprayed (or coated) at a 45 degree angle by moving thespraying system 805 (e.g., a plasma spray gun) perpendicularly 807 tothe axis of rotation of the article 806 (e.g., horizontally) across thearticle 806 while the article 806 is rotating, such that the spray ismulti-directional 809. In one embodiment, the spraying system isstationary and the article is moved.

In operation 904, as shown in block 802, the outer diameter 822 of thearticle 806 is sprayed (or coated) by moving the spraying gun 805parallel 808 to the axis of rotation of the article 806 (e.g.,vertically) beside the article 806 while the article 806 is rotating,such that the spraying is uni-directional 810. In one embodiment, thespraying system is stationary and the article is moved.

In operation 906, as shown in block 801, the article 806 is flipped, andthe front side 820 of the article 806 is sprayed (or coated) at a 45degree angle by moving the spraying system 805 perpendicularly 807 tothe axis of rotation of the article 806 (e.g., horizontally) across thearticle 806 while the article 806 is rotating, such that the spray ismulti-directional 809. In one embodiment, the spraying system isstationary and the article is moved.

In operation 908, as shown in block 802, the outer diameter of thearticle 806 is again sprayed (or coated) by moving the spraying system805 parallel 808 to the axis of rotation of the article (e.g.,vertically) beside the article 806 while the article 806 is rotating,such that the spraying is uni-directional 810.

At block 909, it is determined whether to repeat the sequence of blocks902-908. In one embodiment, the sequence is repeated one time. If thesequence is to be repeated, the process returns to block 902, andspraying continues in a sequence of flip article, operation 902,operation 904, flip article, operation 906, and operation 908. If theoperations of blocks 902-908 are not to be repeated at block 909, thenspraying continues in a sequence of flip article, coat the back side ofthe article at operation 910, flip article, and coat front side ofarticle at operation 912.

Since the outer diameter is sprayed fewer times than the front side andback side, the coating on the front side and the back side is thickerthan the coating on the outer diameter, such that there is less build upof the coating at the edges of the article. Further, since the coatingis applied in multiple layers, there is also less likely to be build upof the coating at the edges of the article. Reduced build up at theedges of the article improves particle performance because there is lessimproperly adhered coating at the edges of the article from whichparticles can dislodge. Further, since the front side (which faces theplasma during etching) is coated last, the surface of the coating isless likely to have circulating particles from the coating of othersurfaces improperly adhered which could dislodge and degrade particleperformance.

Another spray sequence, e.g., CIP #2, according to one embodiment,includes operation 902, operation 904, operation 906, flipping thearticle 806, and operation 908. Here, operations 902, 904, 906, and 908are not repeated. Rather, spraying may continue in a sequence of fliparticle 806, operation 902, operation 904, flip article 806, andoperation 906. Next, spraying continues in a sequence of flip article806, operation 902, flip article 806, and operation 906. CIP #2 isdifferent from CIP #1 because the outer diameter of the article iscoated even fewer times in CIP #2 than CIP #1.

Since the outer diameter is sprayed fewer times than the front side andback side, in one embodiment, the coating on the front side and the backside may be thicker than the coating on the outer diameter, such thatthere is less build up of the coating at the edges of the article.Further, since the coating is applied in multiple layers, there is alsoless likely to be build up of the coating at the edges of the article.Reduced build up at the edges of the article improves particleperformance because there is less improperly adhered coating at theedges of the article from which particles can dislodge. Further, sincethe front side (which faces the plasma during etching) is coated last,the surface of the coating is less likely to have circulating particlesfrom the coating of other surfaces improperly adhered which coulddislodge and degrade on-wafer particle performance.

Referring again to FIG. 4, at block 408, plasma coating characterizationmay be performed. This may include determining a surface morphology, aroughness, a porosity, identifying surface nodules, and so forth. Forexample, FIG. 10 shows an SEM view of three examples, 1st prototype, CIP#1, and CIP #2, of coatings at three magnifications 1000×, 4000×, and10000×. In this example, CIP #2 displays a more preferred surfacemorphology with a lower roughness and fewer surface nodules. Also, FIG.11 shows an SEM view of a cross-section of examples of coatings, wherethe number of nodules along a one inch sample are counted at 2000×magnification. In this example, CIP #2 displays fewer surface nodules.

The preceding description sets forth numerous specific details such asexamples of specific systems, components, methods, and so forth, inorder to provide a good understanding of several embodiments of thepresent disclosure. It will be apparent to one skilled in the art,however, that at least some embodiments of the present disclosure may bepracticed without these specific details. In other instances, well-knowncomponents or methods are not described in detail or are presented insimple block diagram format in order to avoid unnecessarily obscuringthe present disclosure. Thus, the specific details set forth are merelyexemplary. Particular implementations may vary from these exemplarydetails and still be contemplated to be within the scope of the presentdisclosure.

Reference throughout this specification to “one embodiment” or “anembodiment” means that a particular feature, structure, orcharacteristic described in connection with the embodiment is includedin at least one embodiment. Thus, the appearances of the phrase “in oneembodiment” or “in an embodiment” in various places throughout thisspecification are not necessarily all referring to the same embodiment.In addition, the term “or” is intended to mean an inclusive “or” ratherthan an exclusive “or.”

Although the operations of the methods herein are shown and described ina particular order, the order of the operations of each method may bealtered so that certain operations may be performed in an inverse orderor so that certain operation may be performed, at least in part,concurrently with other operations. In another embodiment, instructionsor sub-operations of distinct operations may be in an intermittentand/or alternating manner.

It is to be understood that the above description is intended to beillustrative, and not restrictive. Many other embodiments will beapparent to those of skill in the art upon reading and understanding theabove description. The scope of the disclosure should, therefore, bedetermined with reference to the appended claims, along with the fullscope of equivalents to which such claims are entitled.

What is claimed is:
 1. A chamber component for a processing chamber,comprising: a body comprising at least one of Al, Al₂O₃, or SiC; and aplasma sprayed ceramic coating on the body, the plasma sprayed ceramiccoating being composed of a solid solution consisting of Y₂O₃ and atleast one of ZrO₂, Al₂O₃, HfO₂ or Er₂O₃, wherein: a number of nodulesper inch at a surface of the plasma sprayed ceramic coating is in arange from about 30 nodules per inch to about 45 nodules per inch; and aporosity of the plasma sprayed ceramic coating is in a range from about2.5% to about 3.2%.
 2. The chamber component of claim 1, wherein anaverage surface roughness of the plasma sprayed ceramic coating is about220 micro-inches to about 250 micro-inches.
 3. The chamber component ofclaim 1, wherein the ceramic coating coats a font side of the body, aback side of the body and an outer diameter of the body, and wherein theceramic coating is thicker on the front side of the body and the backside of the body than on the outer diameter of the body.
 4. The chambercomponent of claim 1, wherein the plasma sprayed ceramic coating iscomposed of Y₄Al₂O₉ (YAM) and a solid solution of Y₂O₃—ZrO₂, and whereinthe plasma sprayed ceramic coating consists essentially of Y₂O₃ in arange of about 50 mol % to about 75 mol %, ZrO₂ in a range from about 10mol % to about 30 mol %, and Al₂O₃ in a range from about 10 mol % toabout 30 mol %.
 5. The chamber component of claim 1, wherein the plasmasprayed ceramic coating has a thickness of about 5-40 mil.
 6. Thechamber component of claim 1, wherein the plasma sprayed ceramic coatingis composed of a solid solution of Y₂O₃, Er₂O₃, ZrO₂ and HfO₂.
 7. Thechamber component of claim 1, wherein the plasma sprayed ceramic coatingis composed of a solid solution of Y₂O₃ and ZrO₂.
 8. The chambercomponent of claim 1, wherein the plasma sprayed ceramic coating iscomposed of a solid solution of Y₂O₃ and Er₂O₃.
 9. The chamber componentof claim 1, wherein the plasma sprayed ceramic coating is composed of asolid solution of Y₂O₃, ZrO₂ and Er₂O₃.
 10. A chamber component for aprocessing chamber, comprising: a body of at least one of Al, Al₂O₃, orSiC; and a plasma sprayed ceramic coating on the body, the plasmasprayed ceramic coating being composed of a solid solution consisting ofY₂O₃ and at least one of ZrO₂, Al₂O₃, HfO₂ or Er₂O₃, wherein the plasmasprayed ceramic coating is applied to the body by a method comprising:setting a plasma current of a plasma spraying system to between about 90A to about 150 A; positioning a torch standoff of the plasma sprayingsystem a distance from the body between about 60 mm and about 120 mm;flowing gas through the plasma spraying system at a rate of betweenabout 80 L/min and about 130 L/min; feeding powder comprising the solidsolution consisting of Y₂O₃ and at least one of ZrO₂, Al₂O₃, HfO₂ orEr₂O₃ into the plasma spraying system, wherein the powder comprises amajority of donut-shaped particles, each of the donut-shaped particleshaving a spherical body with indentations on opposite sides of thespherical body; and plasma spray coating the body to apply the plasmaspray coating onto the body, wherein the donut-shaped particles causethe plasma sprayed ceramic coating to have an improved surfacemorphology and a decreased porosity as compared to powder particleshaving a spherical shape, wherein the improved surface morphologycomprises a reduced amount of surface nodules in a range of about 30nodules per inch to about 45 nodules per inch.
 11. The chamber componentof claim 10, wherein about 50% of the powder has a diameter less thanabout 15 microns.
 12. The chamber component of claim 10, wherein theplasma sprayed ceramic coating is thicker on a front side and a backside of the body than on an outer diameter of the body.
 13. The chambercomponent of claim 10, wherein the method of applying the plasma sprayedceramic coating further comprises applying one or more coats by:rotating the body to expose a plurality of portions of the body whileplasma spray coating the body; coating a back side of the body, whereinthe coating is applied at an approximately 45 degree angle to therotating body as the plasma spray system is moved perpendicular to anaxis of rotation of the body, and wherein the ceramic coating on theback side coating has a thickness of about 2 mil; coating an outerdiameter of the body, wherein the coating is applied horizontally to therotating body as the plasma spray system is moved parallel to the axisof rotation of the body, and wherein the ceramic coating on the outerdiameter has a thickness of about 2 mil; and coating a front side of thebody, wherein the body is flipped and the coating is applied at anapproximately 45 degree angle to the rotating body as the plasma spraysystem is moved perpendicular to the axis of rotation of the body, andwherein the ceramic coating on the front has a thickness of about 2 mil.14. The chamber component of claim 10, wherein the improved surfacemorphology comprises a surface roughness for the plasma sprayed ceramiccoating of about 220 micro inch to about 250 micro inch.
 15. The chambercomponent of claim 10, wherein a cross-sectional porosity of the plasmasprayed ceramic coating is about 2.5% to about 3.2%.
 16. The chambercomponent of claim 10, wherein the plasma sprayed ceramic coating iscomposed of a solid solution of Y₂O₃ and ZrO₂.
 17. The chamber componentof claim 10, wherein the plasma sprayed ceramic coating is composed of asolid solution of Y₂O₃ and Er₂O₃.
 18. The chamber component of claim 10,wherein the plasma sprayed ceramic coating is composed of a solidsolution of Y₂O₃, ZrO₂ and Er₂O₃.
 19. The chamber component of claim 10,wherein the plasma sprayed ceramic coating is composed of a solidsolution of Y₂O₃, Er₂O₃, ZrO₂ and HfO₂.
 20. The chamber component ofclaim 10, wherein the plasma sprayed ceramic coating is composed ofY₄Al₂O₉ (YAM) and a solid solution of Y₂O₃—ZrO₂, and wherein the plasmasprayed ceramic coating consists essentially of Y₂O₃ in a range of about50 mol % to about 75 mol %, ZrO₂ in a range from about 10 mol % to about30 mol %, and Al₂O₃ in a range from about 10 mol % to about 30 mol %.